AVS 52nd International Symposium
    Surface Science Monday Sessions
       Session SS-MoP

Paper SS-MoP13
Oxygen-induced Faceting of NiAl(111)

Monday, October 31, 2005, 5:00 pm, Room Exhibit Hall C&D

Session: Surface Science Poster Session
Presenter: E. Loginova, Rutgers University
Authors: E. Loginova, Rutgers University
W. Chen, Rutgers University
N.M. Jisrawi, Rutgers University
T.E. Madey, Rutgers University
Correspondent: Click to Email
We report the adsorption of oxygen and oxygen-induced faceting of NiAl(111), as studied by means of LEED, AES and high-resolution soft XPS(HRSXPS, using synchrotron radiation at NSLS). The atomically rough NiAl(111) surface remains planar at room temperature when exposed to oxygen. However, the surface changes its morphology and becomes faceted upon annealing at 1100K and higher; nucleation and growth of facets are studied. The adsorption and reaction of oxygen are characterized by HRSXPS measurements of Al 2p and Ni 3p core levels for the faceted and planar surfaces. The data indicate that a well-ordered thin aluminum oxide film can be formed on the faceted NiAl surface. Our work is motivated by the possibilty that self-organized alumina thin-film-covered NiAl facets might be used as templates for uniform growth of metallic nanostructures with controlled size and spacing. The Al@sub 2@O@sub 3@/NiAl(111) system is a good model material for studying catalytic reactions over Al@sub 2@O@sub 3@-supported metal catalysts.