AVS 52nd International Symposium
    DNA Topical Conference Monday Sessions
       Session DN-MoP

Paper DN-MoP1
DPN-fabricated Au Microarrays on Si(111) Surfaces for the Site-Selective Immobilization of DNA

Monday, October 31, 2005, 5:00 pm, Room Exhibit Hall C&D

Session: DNA Poster Session
Presenter: I. Kaoru, Nagoya University, Japan
Authors: I. Kaoru, Nagoya University, Japan
I. Takahiro, Nagoya University, Japan
L. SunHyung, Nagoya University, Japan
S. Nagahiro, Nagoya University, Japan
T. Osamu, Nagoya University, Japan
Correspondent: Click to Email
Scanning probe-based lithography allow us to fabricate sub-100 nm structures on surfaces. Dip-pen nanolithography (DPN) is a new promising scanning probe-based tool for fabricating sub-100 nm to many micrometer structures on surfaces, since it is a method for directly depositing metal from an ink-coated atomic force microscope (AFM) tip onto a substrate with a high spatial resolution. In addition, DPN can draw the arbitrary metal patterns on the desired positions without complicated treatments. Thus, it is appropriate to apply DPN to the fabrication of biosensors on Si semiconductor. In order to develop such sensor devices, it is necessary to establish not only a fabrication technique of metal pattern but also an immobilization method of biomolecules on the pattern. In this study, we aim to fabricate Au microarray by DPN and immobilize DNA on the microarray. n-type Si(111) wafer (4-6 Ω cm) were used as substrate. Firstly, the substrate surface was cleaned by a UV/ozone cleaning method. Next, the Si substrate was terminated with hydrogen by wet etching of HF for 15 min. Au microarrays were then directly drawn on hydrogen-terminated silicon substrate using an AFM through DPN. DNA was selectively deposited on the Au microarrays through Au-S bonds. The surface constructed was traced by an AFM and fluorescence-labeled spheres.