| AVS 51st International Symposium | |
| Thin Films | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 10:20am | TF2-TuM7 Atomic Layer Deposition of Tungsten Disulphide Solid Lubricant Coatings T.M. Mayer, T.W. Scharf, S.V. Prasad, R.S. Goeke, M.T. Dugger, Sandia National Laboratories |
| 10:40am | TF2-TuM8 Molybdenum Atomic Layer Deposition Using MoF@sub 6@ and Si@sub 2@H@sub 6@ G.B. Rayner, Jr., S.M. George, University of Colorado |
| 11:00am | TF2-TuM9 Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials J.W. Elam, G. Xiong, C.Y. Han, J.P. Birrell, G.A. Willing, H.H. Wang, J.N. Hryn, M.J. Pellin, Argonne National Laboratory |
| 11:20am | TF2-TuM10 High Reflectivity X-Ray Mirrors from W/Al@sub 2@O@sub 3@ Nanolaminates Fabricated by Atomic Layer Deposition F.H. Fabreguette, Z.A. Sechrist, R.A. Wind, S.M. George, University of Colorado |
| 11:40am | TF2-TuM11 Atomic Layer Deposition of Nickel Oxide Films Using Ni(dmamp)@sub 2@ and Water T.S. Yang, W. Cho, M. Kim, K.-S. An, T.-M. Chung, C.G. Kim, Y. Kim, Korea Research Institute of Chemical Technology |