AVS 51st International Symposium
    Thin Films Friday Sessions

Session TF-FrM
In-Situ/Ex-Situ & Real-Time Monitoring

Friday, November 19, 2004, 8:20 am, Room 303C
Moderator: C.H. Stoessel, Consultant


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am TF-FrM1
Real-time and Spectroscopic Second Harmonic Generation as a Tool to Probe Surface Processes during Amorphous Silicon Film Growth
I.M.P. Aarts, J.J.H. Gielis, C.M. Leewis, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands
8:40am TF-FrM2 Invited Paper
MultiChannel Mueller Matrix Ellipsometry for In-Situ and Real Time Analysis of Thin Films and Surfaces
R.W. Collins, C. Chen, I. An, N.J. Podraza, University of Toledo
9:20am TF-FrM4
Analysis of Ti and TiN Thin Film Nucleation, Coalescence, and Growth by Rotating Compensator Multichannel Ellipsometry
C. Chen, The Penn State University, B. Hong, Sungkyunkwan University, Korea, P. Sunal, M.W. Horn, R. Messier, The Penn State University, R.W. Collins, University of Toledo
9:40am TF-FrM5
Comparative Ellipsometric Study of Liquid Helium Thin Films on Au, Cs, HOPG and Rb Substrates
T. McMillan, P. Taborek, J.E. Rutledge, University California Irvine
10:00am TF-FrM6 Invited Paper
Studies of Coupling and Ordering in Magnetic Thin Films with Polarized Neutron Reflectormetry
S.G.E. te Velthuis, Argonne National Laboratory
10:40am TF-FrM8
Real-time Optical Monitoring of Ammonia Decomposition Kinetics in InN Vapor Phase Epitaxy at Elevated Pressures
N. Dietz, M. Strassburg, V. Woods, Georgia State University
11:00am TF-FrM9
In-Situ Real-Time FT-IR Spectroscopy During APCVD: The Effect of B and P Dopants on SiO@sub 2@ Deposition
A. Effenberger, L.D. Flores, J.E. Crowell, University of California, San Diego
11:20am TF-FrM10
Optimal Control on Composition and Optical Properties of Silicon Oxynitride Thin Films
E.C. Samano, J. Camacho, R. Machorro, CCMC-UNAM, Mexico
11:40am TF-FrM11
III Nitride-Based Optical Sensors Integrated with a TOF Mass Spectrometer for Aerosol Characterization.
D. Starikov, N. Medelci, R. Pillai, Integrated Micro Sensors Inc., A. Bensaoula, C. Joseph, Z. Mouffak, University of Houston