| AVS 51st International Symposium | |
| Advanced Surface Engineering | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | SE-MoA1 Invited Paper Control of Nanostructure Evolution in Metastable Transition Metal Nitride Layers using High-Flux, Low-Energy Ion Irradiation during Growth I. Petrov, University of Illinois |
| 2:40pm | SE-MoA3 Investigation of the Solubility in (M@sub x@M'@sub 2-x@)AlC (M and M' = Ti, V, Cr) as well as the Cr-Al-C System J.M. Schneider, D. Music, Z. Sun, R. Mertens, RWTH Aachen, Germany, R. Ahuja, Uppsala University, Sweden |
| 3:00pm | SE-MoA4 Growth and Characterization of New Epitaxial MAX-Phase Thin Films from the Ti@sub n+1@(Si, Ge)C@sub n@ Systems by Magnetron Sputtering H. Högberg, J. Emmerlich, Linköping University, Sweden, J.-P. Palmquist, Kanthal AB, Sweden, P. Eklund, Linköping University, Sweden, O. Wilhelmssson, Uppsala University, Sweden, L. Hultman, Linköping University, Sweden, U. Jansson, Uppsala University, Sweden |
| 3:20pm | SE-MoA5 Epitaxial Growth of B1-NaCl-Structure HfN@sub x@ Layers on MgO(001) by Ultrahigh Vacuum Magnetron Sputter Deposition H.-S. Seo, T.-Y. Lee, J.G. Wen, University of Illinois, D. Gall, Rensselaer Polytechnic Institute, I. Petrov, J.E. Greene, University of Illinois |
| 3:40pm | SE-MoA6 Surface Morphological Evolution of Epitaxial CrN(001) Layers J.R. Lynch, J. D'Arcy-Gall, S.V. Kesapragada, D. Gall, Rensselaer Polytechnic Institute |
| 4:00pm | SE-MoA7 Stress Reduction in Sputter Deposited Tungsten Films Using Nanostructured Compliant Layers by High Working-Gas Pressures T. Karabacak, J.J. Senkevich, G.-C. Wang, T.-M. Lu, Rensselaer Polytechnic Institute |
| 4:20pm | SE-MoA8 High Powered Pulsed Magnetron Sputtering of Metallic Films in Ar, Ne, and He Plasmas S.L. Rohde, J. Li, D.M. Mihut, University of Nebraska-Lincoln |
| 4:40pm | SE-MoA9 The Dominance of Oxygen in Two-Gas Reactive Sputtering of Oxynitride Films W.D. Sproul, D.C. Carter, D.J. Christie, Advanced Energy Industries, Inc. |
| 5:00pm | SE-MoA10 Ion Assisted Deposition of Zirconium Nitride using Balanced and Unbalanced Magnetron Sputtering S. Guruvenket, Indian Institute of Science, India |