| AVS 51st International Symposium | |
| Applied Surface Science | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | AS-TuM1 Light Induced Chemically Resolved Electrical Measurements (LICREM) in XPS: Anomalous Photoresponse of CdSe Nanoparticle Films H. Cohen, S. Sarkar, G. Hodes, The Weizmann Institute of Science, Israel |
| 8:40am | AS-TuM2 Validation of Information Gained from the XPS Survey Scan J.E. Castle, C. Lavie-Compin, University of Surrey, UK |
| 9:00am | AS-TuM3 Invited Paper Extensions of Photoelectron Spectroscopy to the Study of Nanoscale Systems R.L. Opila, K. Demirkan, A. Mathew, University of Delaware |
| 9:40am | AS-TuM5 XPS Chemical Depth Profiling Using C@sub 60@ Ion Beams N. Sanada, A. Yamamoto, H. Iwai, ULVAC-PHI, Inc., Japan, J.F. Moulder, Physical Electronics, R. Oiwa, Y. Ohashi, ULVAC-PHI, Inc., Japan |
| 10:00am | AS-TuM6 X-Ray Photoelectron Spectroscopy of Rubber Compounds: Temperature Dependence and Crosslink Distribution G.E. Hammer, The Goodyear Tire & Rubber Company |
| 10:20am | AS-TuM7 Monte Carlo Simulations of Electron Backscattering from Surfaces in Scanning Auger Microscopy C. Powell, NIST, A. Jablonski, Institute of Physical Chemistry, Poland |
| 10:40am | AS-TuM8 Round Robin Study of Evaluation of Electron Beam Damage of SiO2/Si in Auger Microprobe Analysis S. Tanuma, T. Kimura, National Institute for Materials Science (NIMS), Japan, S. Hashimoto, Kokankeisoku, Japan, M. Inoue, Setsunan University, Japan, M. Suzuki, ULVAC-PHI, Inc., Japan |
| 11:00am | AS-TuM9 Performance of a High throughput TOF-HREELS Analyzer Z. Yang, University of Maine, R.H. Jackson, Stillwater Scientific Instruments, P.H. Kleban, B.G. Frederick, University of Maine |
| 11:20am | AS-TuM10 Oxygen Environmental Electron Spectroscopy and Microscopy: A New Concept for Reducing Harmful Electron Beam Effects on Insulating Samples Y. Ji, H. Guo, Beijing University of Technology, China, V. Kempter, Technische Unviversität Clausthal, Germany |