AVS 51st International Symposium
    Surface Science Monday Sessions
       Session SS2-MoA

Paper SS2-MoA1
Surface Liquid Behavior of Organic Molecules in Nanoscale Direct Deposition Processes

Monday, November 15, 2004, 2:00 pm, Room 210C

Session: Assembled Monolayers
Presenter: N. Cho, Seoul National University, South Korea
Authors: N. Cho, Seoul National University, South Korea
S. Hong, Seoul National University, South Korea
Correspondent: Click to Email
Nanoscale direct deposition processes such as dip-pen lithography (DPN) have been extensively utilized to pattern organic molecules on solid surfaces. However, complicated 2-dimensional nanoscale diffusion phenomenon in the DPN process has not been clearly understood yet. We propose the surface liquid-based diffusion model that can fully explain complex humidity and temperature dependence of dip-pen lithography. In addition, the study of the long term dependence of DPN deposition rate and phase-separation in the mixed molecular system revealed strong intermolecular interactions during the DPN diffusion process, which also confirms our surface liquid model.