AVS 51st International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP28
NO Decomposition over K-Deposited Pd(111)

Tuesday, November 16, 2004, 4:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: I. Nakamura, National Institute of Advanced Industrial Science and Technology (AIST), Japan
Authors: I. Nakamura, National Institute of Advanced Industrial Science and Technology (AIST), Japan
H. Hamada, National Institute of Advanced Industrial Science and Technology (AIST), Japan
T. Fujitani, National Institute of Advanced Industrial Science and Technology (AIST), Japan
Correspondent: Click to Email
The adsorption and thermal reaction properties of NO on a K-deposited Pd(111) surface were investigated using infrared reflection absorption spectroscopy, X-ray photoelectron spectroscopy, and temperature-programmed desorption. For the K-deposited Pd(111) surface, two different NO adsorption sites were observed in addition to the Pd site. On the clean Pd(111) surface, the adsorption of NO was purely molecular and reversible, but on the K-deposited surface, the adsorbed NO decomposed to N@sub 2@ at two different temperatures, 530 and 610 K. The N@sub 2@ desorption at 530 K was due to the dissociation of NO, indicating that the NO dissociation sites were created on the Pd(111) surface by the deposition of K. On the other hand, the N@sub 2@ desorption at 610 K was due to the decomposition of NO@sub 2@, which was formed by the reaction of adsorbed NO with oxygen produced by NO dissociation. It was clearly shown that two active sites for the decomposition of NO to N@sub 2@ were newly created on the K-deposited Pd(111) surface.