| AVS 50th International Symposium | |
| Thin Films | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-ThA1 Thin-film Cavity Ringdown Spectroscopy (tf-CRDS) for Ultra-sensitive and Direct Detection of Defect-related Absorptions in a-Si:H Thin Films I.M.P. Aarts, B. Hoex, A.H.M. Smets, R. Engeln, Eindhoven University of Technology, The Netherlands, M. Nesládek, Limburgs Universitair Centrum, Belgium, W.M.M. Kessels, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
| 2:20pm | TF-ThA2 Quasi-Real Time in-situ FT-IR Spectroscopy of Doped and Undoped SiO@sub 2@ Deposition from TEOS / Ozone Chemistry J.E. Crowell, L.D. Flores, University of California, San Diego |
| 2:40pm | TF-ThA3 Numerical Analysis of the Three-phase Problem in Optical Diagnostics K.F. Flock, D.E. Aspnes, North Carolina State University |
| 3:00pm | TF-ThA4 Invited Paper Mapping Epitaxial Interfaces with Ultrabright X-rays R. Clarke, University of Michigan, Ann Arbor |
| 3:40pm | TF-ThA6 Real Time X-ray Monitoring of Ta Film Thickness, Phase, and Texture Evolution during Sputter Deposition D. Windover, Rensselaer Polytechnic Institute, S.L. Lee, ARDEC, Benet Laboratories, T.-M. Lu, Rensselaer Polytechnic Institute |
| 4:00pm | TF-ThA7 Invited Paper Epitaxial Growth of Nanostructured Metal/Metal Oxide Thin Films by Ultrahigh Vacuum In-situ TEM M. Yeadon, IMRE, Singapore, J. Yu, National University of Singapore, W. Tian, H.P. Sun, X.Q. Pan, University of Michigan, C.B. Boothroyd, IMRE, Singapore, R.A. Lukaszew, University of Toledo, R. Clarke, University of Michigan, Ann Arbor |
| 4:40pm | TF-ThA9 Growth of Epitaxial Two-dimensional Layers of Indium on Si(100) by Femtosecond Pulsed Laser Deposition M.A. Hafez, M.S. Hegazy, H.E. Elsayed-Ali, Old Dominion University |
| 5:00pm | TF-ThA10 Real-time Observation of Initial Stages of Copper Film Growth on Silicon Oxide using Reflection High-energy Electron Diffraction J.T. Drotar, Rensselaer Polytechnic Institute |