AVS 50th International Symposium
    Semiconductors Tuesday Sessions

Session SC-TuA
Compound Semiconductor Growth and Processing

Tuesday, November 4, 2003, 2:00 pm, Room 321/322
Moderator: P.I. Cohen, University of Minnesota


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm SC-TuA1
Complex Formation between Magnesocene (MgCp@sub 2@) and NH@sub 3@: Origin of the "Memory Effect"
G.T. Wang, J.R. Creighton, Sandia National Laboratories
2:20pm SC-TuA2
Real-time Optical Monitoring of Gas Phase Kinetics in InN Vapor Phase Epitaxy at Elevated Pressures
N. Dietz, V. Woods, Georgia State University
2:40pm SC-TuA3 Invited Paper
Chemical Complexities of AlGaInN MOCVD
J.R. Creighton, G.T. Wang, M.E. Coltrin, W.G. Breiland, Sandia National Laboratories
3:20pm SC-TuA5
Ab initio Prediction of the Gas-Phase Precursors for AlN Sublimation Growth@footnote 1@
Y. Li, D.W. Brenner, North Carolina State University
3:40pm SC-TuA6
Reflectance Interferometry During III-V Nitride Growth, Much More than a Growth Rate Monitor
C.R. Eddy, Jr., R.T. Holm, R.L. Henry, J.C. Culbertson, Naval Research Laboratory
4:00pm SC-TuA7
Real-time Diagnostics of OMCVD Epitaxy with an Integrated Rotating-compensator/Rotating-sample Polarimeter
K.F. Flock, S.J. Kim, M. Asar, D.E. Aspnes, North Carolina State University
4:20pm SC-TuA8
GaN Nucleation Layer Evolution on Sapphire
D.D. Koleske, J.J. Figiel, M.E. Coltrin, A.A. Allerman, K.C. Cross, C.C. Mitchell, M.J. Russell, Sandia National Laboratories
4:40pm SC-TuA9
Investigations of Plasma Etching and Contact Processing on AlGaN Alloys Containing 0 to 50% Al
K.H.A. Bogart, A.J. Fischer, M.H. Crawford, D.D. Koleske, A.A. Allerman, R.J. Shul, D.E. Peebles, Sandia National Laboratories, I. Adesida, University of Illinois at Urbana Champaign, S. Jones, Sandia National Laboratories, D. Selvanathan, University of Illinois at Urbana Champaign, K.W. Fullmer, F. Jalali, Sandia National Laboratories
5:00pm SC-TuA10
Morphological Evolution of GaAs Surface during Damage-free Etching
S.H. Lee, H.P. Gillis, UCLA