AVS 50th International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP25
Adsorption and Reaction of Amines on Germanium and Silicon Surfaces

Tuesday, November 4, 2003, 5:30 pm, Room Hall A-C

Session: Poster Session
Presenter: P. Prayongpan, University of Missouri, Columbia
Authors: P. Prayongpan, University of Missouri, Columbia
C.M. Greenlief, University of Missouri, Columbia
Correspondent: Click to Email
The bonding and structure of organic molecules with semiconductor surfaces is important for a variety of potential applications. This work focuses on the interaction between small organic molecules; ethylamine and allylamine, with Si(100)-2x1 and Ge(100)-2x1 surfaces. Ab initio calculations are used to investigate the transition states and predicted adsorption products for the reactions between the organic molecules and a dimer cluster model of the semiconductor surfaces. The cluster models include Si@sub 9@H@sub 12@, Ge@sub 9@H@sub 12@, and a mixed cluster; Ge@sub 2@Si@sub 7@H@sub 12@. Ultraviolet and x-ray photoelectron spectroscopy are used to examine the chemical bonding of the adsorbed products. This work will examine the effect of electron donating organic molecules with semiconductor surfaces. The selectivity and reactivity of functional groups in the surfaces will be described. According to our recent experimental and theoretical studies, the adsorption products for the interaction between amine molecules with Si(100)-2x1 and Ge(100)-2x1 surfaces are temperature dependent.