AVS 50th International Symposium
    Surface Science Thursday Sessions
       Session SS+OM-ThA

Paper SS+OM-ThA10
Self Assembled Monolayers on Microelectronic Copper Thin Film for Prevention of Corrosion

Thursday, November 6, 2003, 5:00 pm, Room 327

Session: Self-Assembled Monolayers
Presenter: Y.S. Tan, National University of Singapore
Authors: Y.S. Tan, National University of Singapore
M.P. Srinivasan, National University of Singapore
S.O. Pehkonen, National University of Singapore
Y.M. Chooi, Chartered Semiconductor Manufacturing Ltd., Singapore
Correspondent: Click to Email
Abstract: Self-assembled monolayers of dodecanethiol (DT), Mercaptobenzothiazole (MBT), Benzotriazole (BTA) and Imidazole (IMD) were formed by adsorption on the surface of copper thin film used in the ultra large-scale integrated circuits. The films were characterized by X-Ray Photoelectron Spectroscopy (XPS), Fourier Transform Infrared (FTIR) Spectroscopy and contact angle measurements. The corrosion inhibitive behaviours of these organic monolayers were investigated in aerated 0.5 moldm@super -3@ H@sub 2@SO@sub 4@ solutions by means of Electrochemical Impedance Spectroscopy (EIS) and polarization techniques. The presence of the monolayers reduced corrosion by blocking the copper surface from the dissolved oxygen in the acid medium. The relative inhibition efficiencies of these inhibiting agents in preventing copper oxidation is found to be in the order of: DT > MBT > BTA > IMD. The effectiveness of the inhibitors increased with temperature, concentration of the inhibitors and immersion time in the solution. An adsorption model was proposed on the basis of the variation of impedance with inhibitors’ concentration.