AVS 50th International Symposium
    Processing at the Nanoscale Thursday Sessions
       Session PN-ThA

Paper PN-ThA2
Chemical Nanostructures as Templates for the Fabrication of Laterally Patternend Polymer Brushes

Thursday, November 6, 2003, 2:20 pm, Room 317

Session: Molecular Monolayers
Presenter: A. Paul, Universität Heidelberg, Germany
Authors: A. Paul, Universität Heidelberg, Germany
A. Küller, Universität Heidelberg, Germany
U. Schmelmer, TU München, Germany
R. Jordan, TU München, Germany
A. Ulman, Polytechnic University
M. Grunze, Universität Heidelberg, Germany
W. Eck, Universität Heidelberg, Germany
A. Gölzhäuser, Universität Marburg, Germany
Correspondent: Click to Email
Chemical Nanolithography@footnote 1@ utilizes electron beams for the controlled modification of self-assembled monolayers (SAMs). E-beam irradiation of SAMs of nitrobiphenylthiol causes a lateral cross-linking reaction of the biphenyl mesogen along with a simultaneous conversion of the terminal nitro groups to the amine.@footnote 2@ Consecutive reactions such as chemical coupling of chromophores or surface-initiated polymerization can be performed in predefined (irradiated) areas.@footnote 3@ We show the fabrication of polymer brushes with lateral dimensions down to 50 nm by utilizing chemical nanolithography templates for surface-initiated polymerization. Limits of resolution and potential applications will be discussed. @FootnoteText@ @footnote 1@ A. Gölzhäuser et al., Adv. Mater. 13, 806, (2001)@footnote 2@ W. Eck et al., Adv. Mater. 12, 805, (2000)@footnote 3@ U. Schmelmer et al., Angew. Chem. Int. Ed. 42, 559 (2003)