AVS 50th International Symposium
    Organic Films and Devices Tuesday Sessions
       Session OF+EM-TuM

Paper OF+EM-TuM10
Polymeric Aperture Masks for High Performance Organic Integrated Circuits

Tuesday, November 4, 2003, 11:20 am, Room 318/319

Session: Molecular and Organic Films and Devices-Electronics
Presenter: D.V. Muyres, 3M
Authors: D.V. Muyres, 3M
T.W. Kelley, 3M
P.F. Baude, 3M
S. Theiss, 3M
M. Haase, 3M
P. Fleming, 3M
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We present here the use of polymeric aperture masks to fabricate high performance pentacene-based integrated circuits. The aperture masks are fabricated using a laser ablation process with capabilities of generating 10 micron features. A mask set consisting of 4 to 6 aligned layers has been fabricated and has been used to demonstrate functional rf-powered integrated circuits with 20 micron gate lengths. Devices consisted of shadow-mask patterned layers of gold, alumina and pentacene. TFT mobilities greater than 2 cm2/Vs were measured and propagation delays from 7-stage ring oscillators of less than 5 microseconds were observed. This all-additive, dry patterning method has been extended to the production of samples as large as 6 “ x 6 “. Larger aperture masks are under investigation and continuing efforts are focused on automation of the alignment process.