AVS 50th International Symposium
    Nanometer Structures Tuesday Sessions
       Session NS-TuP

Paper NS-TuP21
Metal Pattern Transfer from Microstructured Self-Assembeld Monolayer Templates to Polymer Substrates by an Imprinting Method

Tuesday, November 4, 2003, 5:30 pm, Room Hall A-C

Session: Poster Session
Presenter: S. Imura, Nagoya University, Japan
Authors: S. Imura, Nagoya University, Japan
N. Saito, Nagoya University, Japan
H. Sugimura, Nagoya University, Japan
O. Takai, Nagoya University, Japan
Correspondent: Click to Email
Nanoimprint lithography is expected to play a crucial role in device nanoprocessing. The method has been employed in order to transfer a minute structure on a mold to a polymer film. Besides fabrication of such 3D polymer nanostructures, nanopatterning a functional material other than polymers through nanoimprint is of further interest. Here we show the first demonstration of metal pattern formation by a imprinting method in which a metal micropattern deposited on a microsturctured template was directly transferred onto a polymer substrate. First, a microtemplate was fabricated as follows. An organic self-assembled monolayer was formed from 1-undecanol on a Si substrate of which surface oxide was removed by HF etching. This monolayer was micropatterned by a photolithographic method.@footnote 1@ Due to irradiation at a wavelength of 172 nm, the monolayer was photochemically decomposed and the underlying Si was oxidized. Consequently, a micropattern on a photomask was printed on the sample as a micropattern consisting of the unirradiated monolayer and photochemically formed SiO@sub2@. Next, this microtemplate was immersed in a tin solution, a palladium solution and a Ni electroless plating solution, in that order. Ni was deposited selectively on the unirradiated monolayer while the oxide surface remained undeposited. Finally, this Ni micropattern deposited on the template was transferred onto a polymer substrate. The template was heated to a temperature of 180 °C and pressed into a polymethylmetacrylate (PMMA) substrate at a pressure of 10 MPa. The Ni micropattern was successfully transferred from the template to the PMMA substrate. @FootnoteText@ @footnote 1@H. Sugimura et al. Langmuir 16, 885 (2000).