AVS 50th International Symposium
    Applied Surface Science Tuesday Sessions
       Session AS-TuM

Paper AS-TuM2
Advances in Chemical Imaging: NanoSAM and NanoESCA

Tuesday, November 4, 2003, 8:40 am, Room 324/325

Session: Image Analysis and Polymer Characterization
Presenter: J. Westermann, Omicron NanoTechnology, GmbH, Germany
Authors: J. Westermann, Omicron NanoTechnology, GmbH, Germany
G. Schaefer, Omicron NanoTechnology, GmbH, Germany
D. Funnemann, Omicron NanoTechnology, GmbH, Germany
M. Maier, Omicron NanoTechnology, GmbH, Germany
Correspondent: Click to Email
Electron spectroscopy has been a proven tool for scientific applications for decades. Challenging new applications are emerging from the fields of semiconductor and nanotechnology research and a key issue for these areas is the non-destructive imaging of sensitive structures with nanoscale dimensions. Characterization of their chemical composition and electrical properties goes hand in hand with this. We report on the development of two novel electron microscopes for chemical imaging that meet these requirements, especially for lateral image resolution in the nanoscale range. I. NanoSAM We present electron optical concepts and first results of a truly UHV compatible SEM column designed to meet the requirements for high-resolution with high beam currents. Performance checks on nanostructured samples demonstrate spot sizes below 3 nm at 15 keV beam energy and better than 5 nm at 3 keV, with sample currents being suitable for Auger electron analysis. Latest static Auger and SAM results, demonstrating the outstanding spatial resolution, will be shown. II. NanoESCA We present a parallel imaging electron microscope with an integrated high-resolution energy filter for Imaging XPS. It consists of a Photo Emission Electron Microscope (PEEM) with a large angular acceptance and an aberration corrected energy filter. The microscope allows for imaging with chemical contrast (Imaging ESCA) by energy filtering of photoelectron images. The analyzed energy of the photoelectron images ranges from threshold photoemission to 1600 eV. The instrument has been characterized with laboratory and synchrotron excitation sources. The spatial resolution limit measured so far in imaging ESCA mode is about 150 nm. The measured energy resolution follows the theoretical calculations. We show XPS spectra and energy filtered image series (video sequences) of: AlGaAs heterostructures, microstructured Au/Si and Ag/Ta samples.