| AVS 49th International Symposium | |
| Nanometer Structures | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | NS-FrM1 Invited Paper Correlated Spectroscopic and Scanning Probe Microscopy Approaches to Studying Molecular Assemblies at Interfaces C. Yip, University of Toronto, Canada |
| 9:00am | NS-FrM3 Invited Paper ATR Vibrational Spectroscopy Towards Single Molecule Sensitivity and Molecular Level Spatial Resolution M. Futamata, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| 9:40am | NS-FrM5 Accurate Real-Space Measurements of Surface Lattice Parameters J.A. Kramar, G.M. Witzgall, V.P. Scheuerman, National Institute of Standards and Technology |
| 10:00am | NS-FrM6 Microwave Evanescent Microscope with Coupled Shear-field Topography Measurement S.W. Robey, S.J. Stranick, National Institute of Standards and Technology |
| 10:20am | NS-FrM7 Factors Influencing the Capacitance-Voltage Characteristics Measured by the Scanning Capacitance Microscope G.H. Buh, National Institute of Standards and Technology and Seoul Nat'l Univ., Korea, J.J. Kopanski, J.F. Marchiando, A.G. Birdwell, National Institute of Standards and Technology, Y. Kuk, Seoul National University, Korea |
| 10:40am | NS-FrM8 Two-Dimensional Dopant Profiling by Novel Scanning Capacitance Force Microscopy K. Kobayashi, K. Kimura, H. Yamada, K. Matsushige, Kyoto University, Japan |
| 11:00am | NS-FrM9 Imaging Subsurface Reflection Phase with Quantized Electrons I.B. Altfeder, V. Narayanamurti, D. Chen, Harvard University |
| 11:20am | NS-FrM10 Spectroscopic Scanning Tunneling Microscopy Using Semiconductor Tips with Engineered Electronic Structure P.W. Sutter, J.S. Palmer, P. Zahl, E.A. Sutter, Colorado School of Mines |
| 11:40am | NS-FrM11 First SEM, SAM and Combined SEM/STM Results of a Novel UHV Compatible Electron Column with Sub 3 nm Resolution J. Westermann, M. Maier, G. Schaefer, OMICRON NanoTechnology GmbH, Germany, J. Bihr, LEO Elektronenmikroskopie GmbH, Germany, J. Zach, CEOS GmbH, Germany, T. Berghaus, OMICRON NanoTechnology GmbH, Germany |