AVS 49th International Symposium
    Thin Films Monday Sessions
       Session TF-MoM

Paper TF-MoM8
Scandium and Vanadium Multilayer Mirrors: Working towards High Reflectivity in the Extreme Ultraviolet

Monday, November 4, 2002, 10:40 am, Room C-101

Session: Optical Thin Films
Presenter: G.A. Acosta, Brigham Young University
Authors: G.A. Acosta, Brigham Young University
D.D. Allred, Brigham Young University
N.D. Webb, Brigham Young University
Correspondent: Click to Email
Despite bulk reflectivities of materials in the EUV being typically less than 7%, it is possible to design a multilayer mirror using thin films to achieve reflectivities in the vicinity of 30-40%. Inspired by the 1998 Uspenski paper (Optics Letters, Vol. 23, No.10) which theorized 72% reflectance of 42 nm light, we have been working on developing a design scheme that uses the rare earth metal scandium to achieve such high reflectivities. To characterize our thin film samples, they were studied using X-ray diffraction, atomic force microscopy, ellipsometry, X-ray photoelectron spectroscopy, and an EUV scanning monochromator. Optical constants were found experimentally over the 800-200nm range, as well as in the EUV.