AVS 49th International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP8
Formation pf Platinum Silicides on Si as followed by AES and XRD

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Surface Science Poster Session
Presenter: J. Liday, Slovak University of Technology Bratislava, Slovakia
Authors: J. Liday, Slovak University of Technology Bratislava, Slovakia
M. Jergel, CINVESTAV-IPN, Mexico
P. Vogrincic, Slovak University of Technology Bratislava, Slovakia
I. Hotovy, Slovak University of Technology Bratislava, Slovakia
R. Kosiba, Slovak University of Technology Bratislava, Slovakia
G. Ecke, Technical University of Ilmenau, Germany
Correspondent: Click to Email
Auger electron spectroscopy was used for depth profiling of platinum silicide thin layer formed as a result of annealing of 43 nm platinum layers deposited on Si (111). The factor analysis was utilized for interpretation of Auger spectra. The stoichiometry of silicide layers was determined by X-ray diffraction in both Bragg-Brentano and grazing incidence (at angles 0,5°, 1°, 1.5° and 2°) geometries in order to distinguish the depth distribution of intermediate platinum silicide phases (Pt@sub3@Si, Pt@sub2@Si, PtSi).