AVS 49th International Symposium
    Organic Films and Devices Tuesday Sessions
       Session OF+SS+EL+SC-TuA

Invited Paper OF+SS+EL+SC-TuA3
Vapor Deposition and Polymerization of Low-k Polycyanurate Films

Tuesday, November 5, 2002, 2:40 pm, Room C-102

Session: Organic Molecular Films
Presenter: J.N. Russell, Jr., Naval Research Laboratory
Authors: J.N. Russell, Jr., Naval Research Laboratory
V.J. Bellitto, Naval Research Laboratory
B. Bartlett, Naval Research Laboratory
MJ Brooks, Naval Research Laboratory
P.G. Santangelo, Naval Research Laboratory
A.W. Snow, Naval Research Laboratory
Correspondent: Click to Email
Future microelectronics will require advanced materials and processes for smaller, faster and more robust devices. Polymers address these needs and range from ultra-low permittivity materials to molecular semiconductors. Developing and understanding solventless deposition processes such as vapor deposition polymerization is important for producing conformal, voidless polymer films. One class of low-k polymers, polycyanurates, shows promise as a vapor depositable material. Yet little is known about the surface chemistry of the cyanate functionality and the conditions required for surface polymerization. Initially the surface chemistry of key functionalities in the monomer and polymer are examined using model compounds such as phenyl cyanate and triazine on Al(111). Aluminum was chosen because it is used for interconnects in microelectronics. Then, the in situ vacuum deposition and polymerization chemistry of NCO-CH2(CF2)6 CH2-OCN (F6Cy) is studied on Al, Cu, and Si surfaces. The vapor deposited F6Cy monomer film undergoes a photo-induced cyclotrimerization process to form cross-linked cyanurate networks with a permittivity of 2.1 at 1 GHz.