AVS 49th International Symposium
    Nanometer Structures Tuesday Sessions
       Session NS-TuP

Paper NS-TuP2
Atomic Force Microscope Assisted Oxidation of Zirconium Surfaces

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Nanometer Structures A
Presenter: N. Farkas, The University of Akron
Authors: N. Farkas, The University of Akron
G. Zhang, The University of Akron
S.F. Lyuksyutov, The University of Akron
E.A. Evans, The University of Akron
R.D. Ramsier, The University of Akron
J.A. Dagata, National Institute of Standards and Technology
Correspondent: Click to Email
We present results from scanning probe oxidation of zirconium (Zr) surfaces using atomic force microscope tips in air. For both single-crystal and sputter deposited thin-films of zirconium, rapid oxide growth kinetics are replaced by much slower processes as a function of oxidation time (0 - 300 s). We track these kinetics vs. Zr film thickness (10 - 50 nm), relative humidity (25 - 60 %), and applied voltage (0 - 20 V). In addition, we are able to modify the nanolithographic process by incorporating nitrogen into the top 10 nm of the sputtered films. Our results contribute to a more comprehensive description of the nanolithographic process and complement efforts to model and control the oxidation of Zr surfaces.