IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Surface Engineering Tuesday Sessions

Session SE-TuM
Surface Engineering II: Cleaning, Modification, and Finishing

Tuesday, October 30, 2001, 8:20 am, Room 132
Moderator: L.-Q. Wang, Pacific Northwest National Laboratory


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am SE-TuM1 Invited Paper
PVD Surface Engineering Utilising Combined Steered Cathodic Arc and Unbalanced Magnetron Sputter Deposition
W.-D. Münz, Sheffield Hallam University, UK
9:00am SE-TuM3
Surface Processing of Large-scale FEL SS Test Electrodes by PSII/PVD to Suppress Field Emission
L. Wu, D.M. Manos, College of William and Mary, F. Dylla, C. Sinclair, T. Siggins, Thomas Jefferson National Accelerator Facility
9:20am SE-TuM4
Noncontact Physical Removal of Nano-scale Particles from Surfaces
A.A. Busnaina, Northeastern University, H. Lin, Clarkson University
9:40am SE-TuM5
Photoresist Removing using Atomic Hydrogen Generated by Heated Catalyzer
A. Izumi, H. Matsumura, Japan Advanced Institute of Science and Technology (JAIST), Japan
10:00am SE-TuM6
Low Temperature Remote Plasma Cleaning of the Fluorocarbon and Polymerized Residues formed during Contact Hole Dry Etching
H. Seo, H. Soh, Y. Kim, Y.C. Kim, H. Jeon, Hanyang University, Korea
10:20am SE-TuM7
Polymer Metallization - Comparing the Effect of Pre- and Post Surface Modification on the Cu/PVC and Cu/PTFE Systems
C.C. Perry, S.R. Carlo, J. Torres, D.H. Fairbrother, The Johns Hopkins University
10:40am SE-TuM8
Metallization of PVC - Physical Vapor Deposition and Effect of Ar@super +@/X-ray Pre and Post Treatment
S.R. Carlo, C.C. Perry, J. Torres, D.H. Fairbrother, The Johns Hopkins University
11:00am SE-TuM9
Does Thermal Spike Effect Ion Mixing at Ion Energy Lower than 1.5 keV?
M. Menyhard, G. Zsolt, Research Institute for Technical Physics and Materials Science, Hungary, P.J. Chen, C.J. Powell, L. Gal, W.F. Egelhoff, National Institute of Standards and Technology