IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Vacuum Science & Technology Thursday Sessions
       Session VST2-ThP

Paper VST2-ThP12
Study the Photoelectron Yield for Al and Cu Materials

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Vacuum Issues in Accelerators Poster Session
Presenter: G.-Y. Hsiung, Synchrotron Radiation Research Center, Taiwan
Authors: G.-Y. Hsiung, Synchrotron Radiation Research Center, Taiwan
C.Y. Yang, National Tsing-Hua University, Taiwan
C.-C. Lee, Synchrotron Radiation Research Center, Taiwan
Y.J. Hsu, Synchrotron Radiation Research Center, Taiwan
J.-R. Chen, Synchrotron Radiation Research Center, Taiwan
Correspondent: Click to Email
The photoelectron yield (PEY) from the Al and Cu materials is measured at the 19B beam line in SRRC. The surface of the test samples is treated by different methods, including the chemical cleaning, glow discharge cleaning, exposing water vapors, etc., prior to the photon irradiation. The alternate surface analysis by XPS, SIMS, TDS, etc. is applied to the samples for comparison of the various surface conditions relating to the PEY. The PEY for the unbaked samples is also compared. The results will be discussed.