IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Vacuum Science & Technology Wednesday Sessions
       Session VST-WeA

Paper VST-WeA8
Influence of the Production Parameters on the Vacuum Properties of Ti-Zr-V Non-evaporable Getter Films

Wednesday, October 31, 2001, 4:20 pm, Room 125

Session: Gas Sorption Phenomena II
Presenter: A. Prodromides, CERN, Switzerland
Authors: C. Benvenuti, CERN, Switzerland
P. Chiggiato, CERN, Switzerland
C. Claeys, CERN, Switzerland
P. Costa Pinto, CERN, Switzerland
A. Prodromides, CERN, Switzerland
V. Ruzinov, CERN, Switzerland
I. Wevers, CERN, Switzerland
Correspondent: Click to Email
Non-evaporable thin film getters of various composition have been produced by sputtering. Among about 20 materials which have been studied, the lowest activation temperature (about 180°C) has been displayed by a Ti-Zr-V coating obtained from a cathode made of intertwisted elemental wires. In order to optimize the vacuum properties of this coating, the production parameters have been varied, namely sputtering configuration (diode or magnetron), discharge gas, deposition rate, discharge voltage, substrate nature and temperature during coating. The films have been variously analysed by electron microscopy, electron stimulated desorption, ultimate pressure, pumping speed and rare gas degassing rate measurements. It has been found that the activation temperature, the pumping speed and surface capacity are strongly affected by the deposition rate and substrate temperature during coating. Optimum characteristics are obtained for high substrate temperatures (about 300 °C) and low deposition rates (about 0.15 µm/h).