IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Tribology Tuesday Sessions
       Session TR+MM-TuP

Paper TR+MM-TuP11
Structure Analysis of Tetrahedral Amorphous Carbon Films using Synchrotron Radiation Light Source

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Poster Session
Presenter: C.S. Lee, Korea Institute of Science and Technology
Authors: C.S. Lee, Korea Institute of Science and Technology
K.-R. Lee, Korea Institute of Science and Technology
K.Y. Eun, Korea Institute of Science and Technology
K.H. Yoon, Yonsei University, Korea
Correspondent: Click to Email
Using energetic condensation of carbon ions from filtered vacuum arc plasma, tetrahedral amorphous carbon (ta-C) films were deposited on Si (100) wafers. During the deposition, a dc bias voltage ranging from 0 to -500V was applied to obtain films with various atomic-bond structures. Mechanical properties of ta-C films show the strong dependency on applied bias. The change of the atomic bond structure in ta-C film was analyzed by near edge x-ray absorption fine structure (NEXAFS). In the present work, we focused on the changes in NEXAFS spectrum in various deposition condition and post annealing processes. The relationship between peaks observed in the spectrum and the structural change in the film was identified in the conjunction with Raman and electron paramagnetic resonance spectroscopy (EPR). Based on these results, the suggested models on the atomic bond structure of ta-C film will be discussed.