IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Wednesday Sessions
       Session TF-WeA

Paper TF-WeA1
Spectroscopic Ellipsometry Studies on Film Smoothness of Sputtered Thin Films@footnote 1@

Wednesday, October 31, 2001, 2:00 pm, Room 123

Session: Nucleation and Growth
Presenter: C. Liu, Argonne National Laboratory
Authors: C. Liu, Argonne National Laboratory
J. Erdmann, Argonne National Laboratory
A. Macrander, Argonne National Laboratory
Correspondent: Click to Email
For x-ray mirrors, it is very important to have the surface roughness controlled at less than a few @Ao@ rms. Sophisticated polishing techniques have been developed to obtain substrate roughness less than 3 @Ao@. Quite often, x-ray mirrors are coated with various metals for optimum reflectivity at selected energies. One needs to make sure that the coating process will not introduce excess roughness. Spectroscopic ellipsometry has been broadly used for film thickness and morphology measurements. Here we report a new method to study the smoothness for films that are usually too thick for an ellipsometer to measure. We found that a thin C film usually follows the substrate morphology and will not introduce additional roughness. A thin C film was grown on the film to be studied; ellipsometry measurements were then carried out. The ellipsometry data were fit with both a flat-film and rough-film model to obtain the film smoothness information. Results of C/Au, C/W, and C/Cu films on Si and glass substrates will be discussed. @FootnoteText@ @footnote 1@This work is supported by the U. S. Department of Energy, Basic Energy Sciences, Office of Science, under Contract No. W-31-109-ENG-38.