IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Tuesday Sessions
       Session TF-TuP

Paper TF-TuP7
Influence of the Deposition Conditions on the Growth and Structure of Fe Films on Cu(001)

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Microstructure, Oxides, and Optical Properties Poster Session
Presenter: S.K. Clowes, Rutgers University
Authors: S.K. Clowes, Rutgers University
L.V. Goncharova, Rutgers University
B.J. Hinch, Rutgers University
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We have undertaken an in-depth study into the growth and structure of Fe/Cu(001) films using helium atom scattering, AES and SPA-LEED. This is a system which has been extensively studied during the last two decades, but which has produced a number of contradictory conclusions for the growth mode of the Fe films. This study has paid particular attention to the effects that the specific conditions during deposition have on the growth and quality of the films. These include the rate-of-deposition, surface defects, substrate temperature and contaminants such as oxygen. It is known that oxygen allows the formation of a single, well ordered, monolayer by reducing the surface free energy when it is adsorbed in the fcc hollow site. In a similar manner, it is suggested that under certain conditions oxygen can behave as a surfactant during the deposition of thicker films, promoting layer-by-layer/bilayer growth.