IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Tuesday Sessions
       Session TF-TuP

Paper TF-TuP5
Micro-crystallites in Mo/Si Multilayer EUV Coatings

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Microstructure, Oxides, and Optical Properties Poster Session
Presenter: E. Louis, FOM-Rijnhuizen, The Netherlands
Authors: E. Louis, FOM-Rijnhuizen, The Netherlands
I.J. Wever, FOM-Rijnhuizen, The Netherlands
A.E. Yakshin, FOM-Rijnhuizen, The Netherlands
F. Bijkerk, FOM-Rijnhuizen, The Netherlands
J. Verhoeven, FOM-Amolf, The Netherlands
E. Ziegler, European Synchrotron Radiation Facility, France
Correspondent: Click to Email
The reflectivity of 13.5 nm radiation by a Mo/Si multilayer system (periodicity 6.7 nm) depends strongly on the interface roughness and the thickness of the interfacial molybdenum-silicide layers. Ideally, the structure of the constituent layers of these Mo/Si coatings is amorphous. In this work we show results of X-ray diffraction experiments that clearly show the presence of small crystallites in the Mo layers, and, depending on the process parameters during the deposition of the layers, in the molybdenum-silicide interlayers. By varying the incident angle and the energy, we were able to observe a preferential orientation of the crystallites. The crystal orientation was found to depend on the various process conditions during the deposition of the layers and ion beam smoothening of the interfaces. We also observed indications of stress in the Mo-crystallites. The results were obtained using Cu-K radiation in an in-house diffractometer (Philips MRD) as well as 16 keV photons at beam line BM5 at the European Synchrotron Radiation Facility (ESRF) in Grenoble, France.