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       Session TF-TuP

Paper TF-TuP20
Optical Absorption in the Visible and Near Infrared Range of Electron-beam Deposited Metal-dielectric Structures

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Microstructure, Oxides, and Optical Properties Poster Session
Presenter: F. Sabary, CEA Le Ripault, France
Authors: F. Sabary, CEA Le Ripault, France
A. de Winne, CEA Le Ripault, France
P. Hamel, CEA Le Ripault, France
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Metal-dielectric structures were deposited by electron beam evaporation. They consist in a silver island film separated from a smooth silver surface by a dielectric material. These structures exhibit strong optical absorptions in the visible range. The spectral position and the amplitude of these absorptions can be modified by changing the mass thickness of the silver island film, the thickness of the dielectric layer and by performing a post-deposition annealing. With appropriate experimental parameters, quasi-total extinction can be obtained. More complex structures have been fabricated by sequential deposition of silver island films and dielectric layers. These structures exhibit a large band absorption in the visible and near infrared range. A theoretical calculation was carried out, based on an effective medium model taking into account the interactions between the silver islands and the metallic substrate.