IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Friday Sessions
       Session TF-FrM

Paper TF-FrM7
Structural and Physical Properties of Carbon Nitride Films with High Nitrogen Content Synthesized by Reactive Pulsed Laser Deposition

Friday, November 2, 2001, 10:20 am, Room 123

Session: Diamond and Related Materials
Presenter: J.P. Zhao, National Institute of Advanced Industrial Science and Technology, Japan
Authors: J.P. Zhao, National Institute of Advanced Industrial Science and Technology, Japan
Z.Y. Chen, National Institute of Advanced Industrial Science and Technology, Japan
T. Yano, National Institute of Advanced Industrial Science and Technology, Japan
T. Ooie, National Institute of Advanced Industrial Science and Technology, Japan
Correspondent: Click to Email
Carbon nitride films with high nitrogen content were prepared by reactive pulsed laser deposition in nitrogen atmosphere. The fourth harmonic from a Q-switch Nd:YAG laser with wavelength of 266 nm and pulse duration of 10 ns was focused onto a high purity (99.99%) highly-oriented-pyrolytic-graphite (HOPG) target for producing carbon plume. The laser was pulsed at a rate of 10 Hz. Laser fluence was kept around 12.7 J/cm@super 2@ during deposition. Base pressure of the deposition chamber was lower than 3x10@super -7@ Torr. Nitrogen gas of 99.999% purity was admitted into the chamber during deposition, with pressure varying from 0.1 to 20.0 Torr. It was found that the nitrogen content in the films first increases with increasing the nitrogen pressure, reaches a maximum of 46 at. % at 5.0 Torr, and then decreases to 37 at.% at 20.0 Torr. The almost pure carbon nitride films were systematically characterized by using X-ray photoelectron spectroscopy (XPS) concerning on the core level and valence band structures. With adding the nitrogen incorporation, both the binding energy and peak intensity of the core level and valence band spectra vary systematically as a function of nitrogen content in the films. Structural and physical properties were also studied by using glancing angle X-ray diffractionmeter (XRD), atomic force microscopy (AFM), Fourier transform infrared (FTIR) spectroscopy, micro-Raman spectroscopy, and UV-visible spectrophotometer. Some fingerprint information that show the role of nitrogen in controlling the electronic structure and physical properties of carbon nitride film were found based on these studies.