IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Thursday Sessions
       Session TF+BI-ThM

Paper TF+BI-ThM8
Polyatomic Ion Deposition of Gradient Thin Films: A New Method for Combinatorial Materials

Thursday, November 1, 2001, 10:40 am, Room 123

Session: Bioactive and Organic/Inorganic Thin Films
Presenter: L. Hanley, University of Illinois at Chicago
Authors: L. Hanley, University of Illinois at Chicago
M.B.J. Wijesundara, University of Illinois at Chicago
E.R. Fuoco, University of Illinois at Chicago
Correspondent: Click to Email
Beams of gaseous ions are used for the growth and modification of interfaces in a wide variety of applications. For example, we have previously shown that mass-selected CF@sub3@@super+@, C@sub3@F@sub5@@super+@, and Si@sub2@O(CH@sub3@)@sub3@@super+@ ions can be employed for the growth and modification of organic thin films on polymer and metal surfaces.@footnote1@We demonstrate here that polyatomic ion beams can also be employed to create chemical gradient thin films by variation of the ion fluence across the substrate. We use mass-selected C@sub3@F@sub5@@super+@ ion deposition in vacuum to create a fluorocarbon gradient film on a polymethylmethacrylate substrate. X-ray photoelectron spectroscopy shows a continuous change in the surface chemistry from that of the native polymer to a fluorocarbon film. The contact angle varies from ~75° to ~95° across the gradient surface. We also examine the production of fluorocarbon films on polystyrene, silicon, and aluminum surfaces from C@sub3@F@sub5@@super+@ ions. Finally, we discuss the general feasibility of producing chemical gradients surfaces from polyatomic ion beams. @footnote1@M.B.J. Wijesundara, Y. Ji, B. Ni, S.B. Sinnott, L. Hanley, J. Appl. Phys. 88 (2000) 5004