The multi-layer films were applied by the ion deposition method. The three-layered and four-layered films consisting of titanium carbide, titanium nitride, chromium nitride, zirconium nitride, carbonitrides, and aluminum oxide with ultra-thin copper and silver intermediate layers were investigated. The total film thickness was ten to twenty five micrometers. The ultra-thin layers were applied between the main layers, the ultra-thin layer thickness being of ten to hundred atomic layers. The main layers were applied at a voltage of one or two hundred volts and the intermediate layers were applied at five to eight hundred volts. The conditions of intermediate layer application ensured creation of the continuous layers. The aim of ultra-thin layers was to provide relaxation in the main layers, to remove the residual stresses, to ensure the high level of adhesion force between the main layers, and to reduce the porosity due to the penetration of ultra-thin layer metal into the main layers. The measurements of the porosity coefficient were performed by electrolytic method using the hydrogen penetration. The porosity factor was found to decrease twice for copper intermediate layers and thrice for the silver intermediate layers. The micro-stress levels were found to be five times less than those for the film of the equal thickness applied without the intermediate layers. The abrasion test had shown the improved wear resistance due to the absence of microchipping as a result of low micro-stress level and high enough film thickness. The main layer application voltage - intermediate layer application voltage ratio was found to be the significant value in reducing a porosity factor.