IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Surface Science Monday Sessions
       Session SS2-MoP

Paper SS2-MoP19
Spectroscopic Ellipsometry in the Infrared Range Applied on HF-cleaning

Monday, October 29, 2001, 5:30 pm, Room 134/135

Session: Surfaces and Interfaces Poster Session
Presenter: J.-C. Cigal, Eindhoven University of Technology, The Netherlands
Authors: J.-C. Cigal, Eindhoven University of Technology, The Netherlands
G.M.W. Kroesen, Eindhoven University of Technology, The Netherlands
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Spectroscopic ellipsometry is a powerful non-destructive diagnostic tool for the study of interfaces and layered systems. By combining this method with Fourier transform infrared spectroscopy one can obtain information on the physical parameters of a complex surface like the complex refractive index, and the thickness of the different layers of the system, and on its chemical composition. We report the design of an ellipsometer running on the principle of rotating compensator ellipsometry. This technique offers many advantages compared to other photometric methods. Among them are the non-ambiguous determination of the ellipsometric parameters and the self-calibration of the apparatus. The imperfect components of the different optical elements are taken into account in the calculation algorithms. To illustrate the performance of such an ellipsometer we will clean a silicon wafer with hydrogen fluoride. The surface will be H-passivated. The wafer will be then exposed to open air. The goal of this experiment is to demonstrate the sensitivity of the instrument by analyzing the first steps of the oxidation of the silicon surface.