IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Surface Science Tuesday Sessions
       Session SS+BI-TuA

Paper SS+BI-TuA4
Photoinduced Processes in Self-Assembled Monolayers on Semiconductor Surfaces

Tuesday, October 30, 2001, 3:00 pm, Room 120

Session: Poirier Memorial Session: Self-Assembled Monolayers II
Presenter: T. Ye, University of Pittsburgh
Authors: T. Ye, University of Pittsburgh
E. McArthur, University of Pittsburgh
E. Borguet, University of Pittsburgh
Correspondent: Click to Email
The photoreactivity of ODS(Octadecylsiloxane) SAMs on semiconductor surfaces under UV illumination in air, has been investigated by a combination of contact angle, FTIR and AFM. This work provides strong evidence that SAM degradation does not result from ozone alone. A combination of UV and oxygen is necessary for monolayer degradation to proceed. AFM measurements on submonolayer coverage SAMs provide direct evidence of the degradation of ODS SAMs and reveal the role of defects in the degradation process. FT-IR and AFM results suggest that the hydrocarbon chain is the reactive site of the monolayers. A microscopic mechanism of the degradation involving hydrogen abstraction is suggested based on the mechanism of gas-phase oxidation of alkanes. These results have implications for photoresist micropatterning and nanotechnology applications that require high spatial resolution.