IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Nanotubes: Science and Applications Topical Conference Tuesday Sessions
       Session NT-TuP

Paper NT-TuP8
Catalyst Effects in Its Deposition Rate and Kinds on Growth and Emission Characteristics of Carbon Nanotubes

Tuesday, October 30, 2001, 5:30 pm, Room 134/135

Session: Poster Session
Presenter: J.H. Han, Sungkyunkwan University, Korea
Authors: J.H. Han, Sungkyunkwan University, Korea
S.H. Choi, Sungkyunkwan University, Korea
T.Y. Lee, Sungkyunkwan University, Korea
Y.W. Jin, Sungkyunkwan University, Korea
J.E. Jung, Sungkyunkwan University, Korea
J.B. Yoo, Sungkyunkwan University, Korea
C.Y. Park, Sungkyunkwan University, Korea
H.J. Kim, Samsung Advanced Institute of Technology, Korea
Y.J. Park, Samsung Advanced Institute of Technology, Korea
I.T. Han, Samsung Advanced Institute of Technology, Korea
N.S. Lee, Samsung Advanced Institute of Technology, Korea
J.M. Kim, Samsung Advanced Institute of Technology, Korea
Correspondent: Click to Email
Research on carbon nanotubes (CNTs) has been extensively carried out in past few years because of their own unique physical properties and their potential applications such as flat panel displays and vacuum microelectronics. In practical applications, a role of metal-catalyst has been very important for growth of CNTs in various synthesis methods. Among effects of metal-catalyst, an initial formation and various kinds of metal-catalyst film may have great effects on CNTs growth. Recently we observed that Ni film used as the catalyst-layer was differently formed according its deposition rate condition and thus CNTs were differently grown on it, hence this was systematically studied. Moreover, effects of a variety of metal-catalyst and buffer-metal on growth and emission characteristics of CNTs were investigated. In our experiments, the deposition rates of Ni film were varied from 1 Å/sec to 10 Å/sec. The metal-catalyst such as Ni, Co, Fe, Co-Fe and the buffer-metal such as Cr, Ti for improvement the adhesion between metal-catalyst and glass substrate were used. We have grown the vertically aligned CNTs on metal-catalyst coated glass with buffer-metal-layer at low temperatures below 550 °C by plasma enhanced chemical vapor deposition (PECVD). A DC plasma was employed, and C@sub 2@H@sub 2@ and NH@sub 3@ was used as a carbon source and a catalyst gas. We examined morphologies of CNTs using field emission scanning electron microscopy (FESEM). Microstructures of CNTs were investigated by high resolution transmission electron microscopy (HRTEM) and emission characteristics of CNTs were evaluated in vacuum chamber below 10@super -6@ Torr using phosphor-coated anode.