Noncontact atomic force microscopes (NC-AFM) using frequency modulation (FM) method have the potential ability to obtain surface structure of any materials, such as metals, semiconductors and insulators with atomic resolution. NC-AFMs simultaneously detect several kinds of forces acting between the tip and the sample surface; the van der Waals force, the chemical bonding force and the electrostatic force (ESF) et al. Each of the forces contains the different physical information about the surface. Although each of them is desirable to be separately detected, no method to completely separate them has not been realized. This lack results in the deviation of the NC-AFM images, namely the 'artifacts.' In this presentation, we propose the novel method to completely separate the ESF from other forces. The Kelvin probe force microscopy (KPFM) is often used to measure and separate the ESF with AFM. However, the KPFMs still involve an extra deviation, which is due to an AC electric field applied for KPFM measurement. Our new method proposed here can completely eliminate the influences due to the ESF on the topography with keeping all merits of KPFM by introducing the artifact eliminator circuit, which adjust the signal for height regulation of the tip. Our method can measure the topography and the spatial distribution of the ESF, which reflects the spatial distribution of work function or charges on the sample surface, with the atomic resolution without the 'artifact.' This system has high possibility to identify the kind of each atom.