IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Nanometer Structures Thursday Sessions
       Session NS-ThP

Paper NS-ThP9
Micro-Fabrication of Sub-wavelength-Size Aperture for Near-Field Optical Probe

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Poster Session
Presenter: M.Y. Jung, Sun Moon University, Korea
Authors: M.Y. Jung, Sun Moon University, Korea
J.W. Kim, Sun Moon University, Korea
D.W. Kim, Sun Moon University, Korea
S.S. Choi, Sun Moon University, Korea
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There have been considerable interests about the microfabrication of the submicron size hole due to the potential application of the near field optical sensor array for gigabyte storage device. We have previously reported fabrication of the submicronsize oxide aperture.@footnote 1@ In this report, the 5 micron size dots were photo-lithographically patterned on the Si (100) wafer. After formation of the V-groove shape utilized by anisotropic KOH etching, the orientation dependent oxide growth was performed to have an etch-mask for dry etching. The reactive ion Cl2 etching using inductively coupled plasma (ICP) system will be performed in order to etch thin SiO2 layer on the bottom of the etch stop and to etch the Si on the bottom. After etching, the fabricated submicron-size oxide aperture followed by a proper metal deposition and silicon nitirde deposition procedures can be utilized as a near field optical probe. @FootnoteText@@footnote 1@Seong S. Choi, J.W. Lee, J.W. Kim, M.Y. Jung, D.W. Kim, American Physical Society Meeting, G32.011, March 21, 2000, Minneapolis, MN. USA.