IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Nanometer Structures Thursday Sessions
       Session NS-ThP

Paper NS-ThP3
Nanostructures of Si Luminescence Materials Fabricated by Microwave Plasma CVD

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Poster Session
Presenter: I. Kato, Waseda University, Japan
Authors: H. Kezuka, Tokyo University of Technology, Japan
I. Kato, Waseda University, Japan
T. Matsumoto, Waseda University, Japan
R. Saito, Waseda University, Japan
T. Suzuki, Tokai University, Japan
Correspondent: Click to Email
The double-tubed coaxial line-type microwave plasma CVD(Chemical Vapor Deposition) system has been developed for obtaining a stable plasma with a low gas pressure in order to fabricate electro-microdevices and photonic devices. In this paper, the microwave plasma CVD is applied for the fabrication of nano-particles of a-Si:H. In this system, the microwave power is confined in the the cavity, and not injected into the plasma in the chamber. Thus,in the deposition chamber,the gas flow forms spatial afterglow plasma with no microwave power injected. He outer discharge tube is composed of fused quartz and the inner tube is made of stainless steel. The Ar gas is fed to the outer discharge tube and the SiH4 gas is fed to to the inner tube.The Ar gas is ionized in the cylindrical cavity region by the microwave power. The SiH4 gas flows into the Ar plasma at the discharge tube end through the inner tube, and then the SiH4 is dissorciated by the microwave power.The substrate table area is 40cm2 and is placed at z = 10 cm. The Ar gas flow rate is 110 ml/min and the SiH4 gas flow rate is 30 ml/mi.After heat-treatments of 72 hrs in air for as-deposited a-Si:H partiles, it is assumed that nano-particles(nanoball) of a-Si:H include nano-crystal(nc) Si characterized from XPS-spectrum of the oxygen 1s region and of the silicon 2p region.From SEM- and AFM-observation of the oxidized surface of nano-particles, the size of nanoballs of a-Si:H is about 20-30nm in diameter.