IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Nanometer Structures Wednesday Sessions
       Session NS+EL-WeA

Paper NS+EL-WeA9
Chemical Nanolithography

Wednesday, October 31, 2001, 4:40 pm, Room 133

Session: Molecular Electronics and Patterning
Presenter: A. Gölzhäuser, Universität Heidelberg, Germany
Authors: A. Gölzhäuser, Universität Heidelberg, Germany
W. Geyer, Universität Heidelberg, Germany
A. Küller, Universität Heidelberg, Germany
V. Stadler, Universität Heidelberg, Germany
W. Eck, Universität Heidelberg, Germany
M. Grunze, Universität Heidelberg, Germany
T. Weimann, Physikalisch Technische Bundesanstalt, Germany
P. Hinze, Physikalisch Technische Bundesanstalt, Germany
K. Edinger, University of Maryland
Correspondent: Click to Email
The efficient fabrication of chemically defined surface nanostructures is an important objective in fields such as molecular electronics, biochips or biosensors. Chemical nanolithography utilizes electron beams to selectively modify self-assembled monolayers, for example to convert NO@sub 2@ end groups in monolayers of nitrobiphenylthiol to NH@sub 2@ groups.@footnote 1,2@ In this presentation, we show that chemical nanolithography can fabricate chemical features with lateral dimensions down to ~20 nm on a variety of different surfaces (noble metals, semiconductors or oxides). E-beam lithography as well as low energy electron proximity printing are used to fabricate chemical surface structures. These are then used as high resolution templates for the laterally controlled electrochemical deposition and for the immobilization of molecules (or macromolecular objects) on predefined surface regions. @FootnoteText@ @footnote 1@ W. Eck, V. Stadler, W. Geyer, M. Zharnikov, A. Gölzhäuser, M. Grunze, Adv. Mater. 12, 805 (2000). @footnote 2@ A. Gölzhäuser, W. Eck, W. Geyer, V. Stadler, T. Weimann, P. Hinze, M. Grunze, Adv. Mater. in press.