IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Magnetic Interfaces and Nanostructures Thursday Sessions
       Session MI-ThP

Paper MI-ThP8
Fabrication of CoCrTa Magnetic Film by RF-sputtering

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Magnetic Thin Films & Surfaces Poster Session
Presenter: Y. Ohta, Fukui National College of Technology, Japan
Authors: Y. Ohta, Fukui National College of Technology, Japan
K. Ohashi, Shin-Etu Chemical Co., Ltd., Japan
T. Tsumori, Shin-Etu Chemical Co., Ltd., Japan
Correspondent: Click to Email
CoCrTa longitudinal media was prepared by sputtering onto Si substrates at substrate temperature of 523 K by RF magnetron sputtering system. The films were fabricated at the substrate temperature of 523K and Argon gas pressure of 3.5 mTorr during sputtering. The film was deposited on surface Si and glass substrates. CoCrTa thin films of several thicknesses were prepared by sputtering. The microstructures and particle size were investigated by transmission electron microscopy (TEM) and atomic force microscopy (AFM). The crystal structure was checked by X-ray diffractometry (XRD) and the magnetic properties were measured by a vibrating sample magnetorometer (VSM). The underlayer thickness dependence of magnetic properties of CoCrTa deposited on Si and glass substrates were investigated. It was known that thickness of underlayer has significant influence the crystallographic texture and magnetic properties of the magnetic layer. CoCrTa layer deposited on the Si substrate revealed small size grain and smooth surface than ones deposited on the glass substrate.