IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Electronics Friday Sessions
       Session EL+SE+TF-FrM

Paper EL+SE+TF-FrM5
Laser Processing Opportunities with a High Average Power Free Electron Laser

Friday, November 2, 2001, 9:40 am, Room 131

Session: Laser Processing of Surfaces
Presenter: H.F. Dylla, Jefferson Lab
Authors: H.F. Dylla, Jefferson Lab
S.V. Benson, Jefferson Lab
J. Boyce, Jefferson Lab
G. Biallas, Jefferson Lab
D. Douglas, Jefferson Lab
G.R. Neil, Jefferson Lab
R. Evans, Jefferson Lab
A. Grippo, Jefferson Lab
J. Guebeli, Jefferson Lab
K. Jordan, Jefferson Lab
M.J. Kelley, Jefferson Lab and College of William and Mary
R. Li, Jefferson Lab
L. Merminga, Jefferson Lab
J. Preble, Jefferson Lab
M. Shinn, Jefferson Lab
T. Siggins, Jefferson Lab
R.W. Walker, Jefferson Lab
G.P. Williams, Jefferson Lab
B. Yunn, Jefferson Lab
Correspondent: Click to Email
A kilowatt class free electron laser has been operational at Jefferson Lab since 1999. The associated user facility laboratories are being used for laser-materials studies that take advantage of the FEL's high average power, broad tunability and sub-picosecond pulse structure. The presently operating FEL delivers kilowatt level powers over the mid-infrared (3-7 microns). Recently, the device has extended operation through the visible (at the 100 watt level) and the UV (at the 10 watt level) through harmonic generation. A major upgrade is currently under way that will increase the power level in the IR to 10 kW and extend kilowatt operation through 300 nm in the UV. FEL users involved in materials processing have demonstrated unique applications involving: pulsed laser deposition, laser nitriding, laser production of carbon nanotubes, laser ablation and laser micromachining.-This work supported by the Office of Naval Research, the Commonwealth of Virginia, DOE Contract DE-AC05-84ER40150, and the Laser Processing Consortium.