AVS 47th International Symposium
    Surface Science Tuesday Sessions

Session SS2+NS+BI+EL-TuM
Self-Assembled Monolayers

Tuesday, October 3, 2000, 8:20 am, Room 209
Moderator: D.H. Fairbrother, Johns Hopkins University


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Click a paper to see the details. Presenters are shown in bold type.

8:20am SS2+NS+BI+EL-TuM1
Creating Highly Selective Organic Surfaces using Self-assembly: A New Family of Organothiols
R. Arnold, Ruhr-Universität Bochum, Germany, A. Terfort, Universität Hamburg, Germany, C. Wöll, Ruhr-Universität Bochum, Germany
8:40am SS2+NS+BI+EL-TuM2
Characterization of the Alkanthiol/Metal Interface by High Resolution Core Level Spectroscopy
K. Heister, H. Rong, M. Buck, University Heidelberg, Germany, L. Johansson, University Karlstad, Sweden, M. Zharnikov, M. Grunze, University Heidelberg, Germany
9:00am SS2+NS+BI+EL-TuM3
The Influence of the Endgroup and the Chain Length on the Growth of CH@sub 3@- and CF@sub 3@-terminated Alkanetiols on Au(111)
J. Pflaum, Princeton University, G. Bracco, University of Genova, Italy, G. Scoles, Princeton University, R. Lee, University of Houston, A. Kahn, Princeton University
9:20am SS2+NS+BI+EL-TuM4
Self-Assembled Monolayers of Terphenyl Derivatized Thiols; Adsorption, Insertion Process and Electrical Conduction
T. Ishida, JRCAT-NAIR and PRESTO-JST, Japan, W. Mizutani, JRCAT-NAIR, Japan, N. Choi, JRCAT-ATP, Japan, H. Tokumoto, JRCAT-NAIR, Japan
9:40am SS2+NS+BI+EL-TuM5 Invited Paper
Structure and Chemistry of Alkanethiol Self-Assembled Monolayers
G.E. Poirier, T.M. Herne, C.C. Miller, M.J. Tarlov, National Institute of Standards and Technology
10:20am SS2+NS+BI+EL-TuM7
Characterization of SAMs with Contrast Variation SPR Technique
K. Tamada, NIMC and RIKEN Frontier Program, Japan, H. Akiyama, J. Nagasawa, NIMC, Japan
10:40am SS2+NS+BI+EL-TuM8
Characterization of a Polymerized Self-Assembled Monolayer Using NEXAFS
A.L. Marsh, D.J. Burnett, University of Michigan, D.A. Fischer, National Institute of Standards and Technology, C.E. Evans, J.L. Gland, University of Michigan
11:00am SS2+NS+BI+EL-TuM9
An Estimation of Effective Mean Free Path of Photo- and Auger Electrons in Partial Yield Measurements using Self-assembled Monolayers
M. Zharnikov, S. Frey, K. Heister, M. Grunze, Universität Heidelberg, Germany
11:20am SS2+NS+BI+EL-TuM10
Growth Process and Thermal Stability of Semifluorinated Alkanethiol Self-Assembled Monolayers on Au(111)
M. Hara, Frontier Research System, RIKEN, Japan, A. Suzuki, Tokyo Institute of Technology, Japan, K. Tamada, National Institute of Materials and Chemistry, Japan, H. Fukushima, Seiko Epson Co., Japan, T.R. Lee, University of Houston
11:40am SS2+NS+BI+EL-TuM11
Multi-technique Study of Self-Assembled AuCN Monolayers on Au(111) Formed by Electrochemical Deposition
T. Yamada, Waseda University, Japan, R. Sekine, Shizuoka University, Japan, T. Sawaguchi, AIST/MITI, Japan