AVS 47th International Symposium
    Surface Engineering Tuesday Sessions

Session SE-TuM
Interface Engineering and Graded Films: Structure and Characterization

Tuesday, October 3, 2000, 8:20 am, Room 201
Moderator: I. Petrov, University of Illinois, Urbana


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:40am SE-TuM2
Epitaxial Growth of Metastable B1-NaCl-Structure TaN@sub x@ on MgO(001) by Ultrahigh Vacuum Reactive Magnetron Sputter Deposition
C.-S. Shin, D. Gall, J.E. Greene, I. Petrov, University of Illinois
9:00am SE-TuM3
Stress Evolution in TiN and TaN Layers and Multilayers Prepared by Reactive Magnetron Sputtering and Studied with in-situ Laser Reflection Curvature Technique
T. Joelsson, J. Birch, P. Sandström, L. Hultman, IFM Linköping University, Sweden
9:20am SE-TuM4
The Compressive Coating Stresses in the Scratch Adhesion Test
Y. Xie, H.M. Hawthorne, National Research Council Canada
9:40am SE-TuM5 Invited Paper
Interface Engineering and Graded Films: Structure and Characterisation
S.J. Bull, University of Newcastle, U.K.
10:20am SE-TuM7
Characterization of Cr@sub 2@N/CrN Multilayer Coatings Produced by Ion-Assisted Reactive Magnetron Sputtering
S.M. Aouadi, University of Nebraska, K.C. Wong, K.A.R. Mitchell, University of British Columbia, Canada, S.L. Rohde, University of Nebraska
10:40am SE-TuM8
Optimization of In Situ Substrate Surface Treatment in a Cathodic Arc Plasma: A Plasma Diagnostics and STEM-EDX Study
C. Schönjahn, A.P. Ehiasarian, W.-D. Münz, D.B. Lewis, R. New, Sheffield Hallam University, UK, R.D. Twesten, I. Petrov, University of Illinois, Urbana
11:00am SE-TuM9
Laterally Graded Multilayers and their Applications@footnote 1@
C. Liu, A. Macrander, Argonne National Laboratory, J. Als-Nielsen, Copenhagen University, Denmark, K. Zhang, Illinois Institute of Technology
11:20am SE-TuM10
A Novel Interface Modification Technique Applied from the Top of a Coated Layer
M. Yoshitake, Y.-R. Aparna, K. Yoshihara, National Research Institute for Metals, Japan