AVS 47th International Symposium
    Surface Engineering Tuesday Sessions

Session SE-TuA
Surface Engineering: Surface Preparation to Postcoating Surface Finishing

Tuesday, October 3, 2000, 2:00 pm, Room 201
Moderator: Y.-W. Chung, Northwestern University


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm SE-TuA1 Invited Paper
Surface Engineering by Plasma Immersion Ion Processing
M.A. Nastasi, Los Alamos National Laboratory
2:40pm SE-TuA3
The Surface Modification of Wear Resistant HSS Cutting Tools with Adapting Engineered Coatings
G.S. Fox-Rabinovich, McMaster University, Canada, A.I. Kovalev, SPRG, Russia
3:00pm SE-TuA4
Enhanced Passivity of Austenitic AISI 304 Stainless Steel by Low-Temperature Ion Nitriding
S. Rudenja, Tallinn Technical University, Estonia, I. Odnevall Wallinder, C. Leygraf, Royal Institute of Technology, Sweden, P. Kulu, V. Mikli, Tallinn Technical University, Estonia
3:20pm SE-TuA5
CVD Diamond Nucleation under Extreme Conditions
K.-A. Feng, Institute of Physics, CAS, China, J. Kang, University of Michigan, Z. Lin, Institute of Physics, CAS, China
3:40pm SE-TuA6
Large-area Nitrogen-doped SiO@sub 2@ Films Deposition in a Large-scale Integrated RF PSII/PVD System
L. Wu, D. Manos, College of William and Mary
4:00pm SE-TuA7
Cleaning, Etching and Oxidation of W films for Microelectronics Applications
P. Cao, M.-S. Lim, S.S. Perry, University of Houston, E.J. Mitchell, D.C. Koeck, H.C. Galloway, Southwest Texas State University
4:20pm SE-TuA8
Reactions of Fluorocarbon Polyatomic Ions with Polymer Surfaces
M.B.J. Wijesundara, L. Hanley, University of Illinois at Chicago
4:40pm SE-TuA9
An Aging Study of Fluorocarbon Plasma Polymers Deposited on Si-C Plasma Polymer Films Using XPS
C.E. Moffitt, D.M. Wieliczka, University of Missouri, Kansas City, Q.S. Yu, C.M. Reddy, H.K. Yasuda, University of Missouri, Columbia
5:00pm SE-TuA10
An XPS Investigation into the Role of Oxygen in the Structural Formation of Methylated Silane Plasma Polymers
C.E. Moffitt, D.M. Wieliczka, University of Missouri, Kansas City, T.M. El-Agez, Islamic University of Gaza, Palestine, Q.S. Yu, C.M. Reddy, H.K. Yasuda, University of Missouri, Columbia