AVS 47th International Symposium
    Vacuum Technology Thursday Sessions
       Session VT-ThM

Paper VT-ThM8
Influence of the Production Parameters on the Vacuum Properties of Ti-Zr-V Non-evaporable Getter Films

Thursday, October 5, 2000, 10:40 am, Room 201

Session: Pumps and Large Vacuum Systems
Presenter: P. Chiggiato, CERN, Switzerland
Authors: C. Benvenuti, CERN, Switzerland
P. Chiggiato, CERN, Switzerland
S. Clair, CERN, Switzerland
J.B. Clark, CERN, Switzerland
P. Costa Pinto, CERN, Switzerland
A. Escudeiro Santana, CERN, Switzerland
V. Ruzinov, CERN, Switzerland
I. Wevers, CERN, Switzerland
Correspondent: Click to Email
Non-evaporable thin film getters of various composition have been produced by sputtering. Among the about 20 materials which have been studied, the lowest activation temperature (about 180°C) has been displayed by a Ti-Zr-V coating obtained from a cathode made of intertwisted elemental wires. In order to optimise the vacuum properties of this coating, the production parameters have been varied, namely sputtering configuration (diode or magnetron), discharge gas, deposition rate, discharge voltage, substrate nature and temperature during coating. The films have been analysed by electron microscopy, electron stimulated desorption, ultimate pressure, pumping speed and rare gas degassing rate measurements. The results are presented and discussed.