AVS 47th International Symposium
    Surface Science Thursday Sessions
       Session SS1+MC-ThM

Paper SS1+MC-ThM10
AFM Non-contact Imaging of Titaniumdioxid at Variable Temperatures

Thursday, October 5, 2000, 11:20 am, Room 208

Session: Oxide Applications and Oxidation
Presenter: P. Güthner, Omicron Vakuumphysik GmbH, Germany
Authors: A. Bettac, Omicron Vakuumphysik GmbH, Germany
P. Güthner, Omicron Vakuumphysik GmbH, Germany
S. Molitor, Omicron Vakuumphysik GmbH, Germany
A. Feltz, Omicron Vakuumphysik GmbH, Germany
T. Berghaus, Omicron Vakuumphysik GmbH, Germany
A.W. Grant, University of Washington
S. Fain, University of Washington
Correspondent: Click to Email
True atomic resolution in AFM non-contact mode has been achieved on several samples. Here we present first images on a TiO@sub 2@ (110) single crystal at sample temperatures from as low as 50 K up to 400° C. A new instrument design allows to perform true atomic resolution AFM images in a temperature range from 25 K to 1000 K. The sample was prepared by several cycles of ion sputtering and annealing in UHV. After this treatment it is conducting enough to perform STM measurements for controlling the quality of surface preparation. Non-contact AFM images on the TiO@sub 2@ (110) crystal show atomic resolution across mono-atomic steps. The surface is mostly showing a 1x1 reconstruction. At the step edges, lines with 1x2 reconstruction are starting. These lines may be associated with the formation of Ti@sub 2@O@sub 3@ strings along the surface. The density of areas with 1x2 reconstruction is increased with the annealing temperature which can be explained by the desorbtion of oxygen during the annealing process. Atomic resolution images on the TiO@sub 2@ (110) crystal were achieved at low temperatures down to 50 K sample temperature and at high temperatures up to 400° C.