AVS 47th International Symposium
    Surface Science Thursday Sessions
       Session SS1+MC-ThA

Paper SS1+MC-ThA3
Comparison of Electrochemical Corrosion Properties and Oxidation Kinetics of Ozone- and Oxygen-formed Aluminum Oxide Films

Thursday, October 5, 2000, 2:40 pm, Room 208

Session: Oxidation and Molecule-Oxide Interactions
Presenter: A. Kuznetsova, University of Pittsburgh
Authors: A. Kuznetsova, University of Pittsburgh
I. Popova, University of Pittsburgh
V. Zhukov, University of Pittsburgh
G. Zhou, University of Pittsburgh
J.C. Yang, University of Pittsburgh
J.T. Yates, Jr, University of Pittsburgh
Correspondent: Click to Email
Ozone, O@sub 3@, has been employed to produce an aluminum oxide layer (thickness about 20 Å), on Al(111)and also on polycrystalline Al surfaces. It has been found, by electrochemical impedance spectroscopy, that the impedance of such films is about 10 times higher than films grown to similar thickness with O@sub 2@.Transmission electron microscopy studies have shown that the average pore size of Al@sub 2@O@sub 3@ films grown with O@sub 3@ (20 Å) is smaller than in films grown with O@sub 2@ (100 Å). In addition, electron diffraction studies of amorphous film have shown that the density of oxide film grown with O@sub 3@ is 10% greater than for oxide films grown with O@sub 2@. Thus the enhanced corrosion passivation properties of O@sub 3@-grown aluminum oxide films may be caused by the reduction of defect site density when O@sub 3@ is used.