AVS 47th International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP9
A Novel Technique for Producing Regular Nano-Channel Arrays

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: S.A. Barnett, Applied Thin Films, Inc.
Authors: S.A. Barnett, Applied Thin Films, Inc.
S. Sambasivan, Applied Thin Films, Inc.
Correspondent: Click to Email
In this paper, we describe a simple method for producing large area nano-channel arrays with channel widths down to 1 nm. The synthetic method involves deposition of multilayers by magnetron sputtering where the width of each layer can be accurately controlled from 1-100nm. Subsequent to the deposition, one of the layers is preferentially etched to leave behind trenches of the other layer left intact. With appropriate choice of chemistry and etching technique,we have demonstrated the feasibility of this technique for a multilayer system. The residual layer and the intervening channels are quite planar for optimized film growth conditions, and thicknesses can be very accurately controlled. A number of applications can be envisioned for these channel arrays. For example, they should make good media for nano-stamping with the choice of a very hard material as one of the component layers. This should allow for imprinting of a wide range of materials. Initial results on nano-stamping will be presented.