AVS 47th International Symposium
    Surface Engineering Monday Sessions
       Session SE+TF-MoM

Invited Paper SE+TF-MoM3
Hard and Superhard Coatings - A Review

Monday, October 2, 2000, 9:00 am, Room 201

Session: Hard and Superhard Coatings
Presenter: W.D. Sproul, Reactive Sputtering, Inc.
Correspondent: Click to Email

Hard coatings such as titanium carbide deposited by the high temperature chemical vapor deposition (CVD) process first made their commercial appearance in the late 1960s. The single layer coatings were soon supplanted with multilayer CVD coatings, but it was difficult to apply these coatings to high speed steel (HSS) tooling or steel alloys without damaging the metallurgical properties of the steel. In the early 1980s, several physical vapor deposition (PVD) techniques became available for depositing hard coatings such as titanium nitride or titanium aluminum nitride onto HSS. One of the driving forces in the PVD coatings business has been a desire to increase the hardness of the coatings with the ultimate goal of matching or exceeding the hardness of diamond. Today superhard (hardness greater than 40 GPa) coatings exist. The hardening mechanisms for achieving superhardness fall into two categories, intrinsic and extrinsic. Intrinsic materials such as diamond, cubic boron nitride, and some ternary compounds rely on high bond energies and short bond lengths to achieve superhardness whereas the extrinsic nanostructured multi-layer and nanocrystalline materials rely on the microstructure to restrict dislocation movement to achieve superhardness. A hardness exceeding that of diamond has been reported for a nanocomposite of titanium nitride and silicon nitride. Coating hardness is only one property that should be considered when engineering a surface. Coating toughness should also be factored in especially in situations where impact loading will occur. Today advances are being made in high-density plasma (HDP) PVD techniques that will have a direct impact on future PVD hard coatings. The high degree of ionization in HDP systems will allow new compounds synthesis at temperatures well below the thermodynamic equilibrium point. Perhaps in the near future crystalline alpha alumina will be deposited below 500 degrees C by HDP PVD techniques.