AVS 47th International Symposium
    Processing at the Nanoscale/NANO 6 Tuesday Sessions
       Session NS+NANO6+SS+MC-TuA

Invited Paper NS+NANO6+SS+MC-TuA1
Dip-Pen Nanolithography: A New Tool for Generating and Studying Soft Nanostructures

Tuesday, October 3, 2000, 2:00 pm, Room 302

Session: Self-assembly and Self-organization
Presenter: C.A. Mirkin, Northwestern University
Authors: C.A. Mirkin, Northwestern University
S.A. Brennan, Northwestern University
L.M. Demers, Northwestern University
S. Hong, Northwestern University
P.V. Schwartz, Northwestern University
D.A. Weinberger, Northwestern University
Correspondent: Click to Email
A new type of ultrahigh resolution soft-lithography, Dip-Pen Nanolithography (DPN) that is interfaceable with biomolecules and biofunctionalized building blocks will be presented. This soft lithography allows one to routinely pattern structures, in serial or parallel fashion, with sub 50 nm spatial and line-width resolution with near-perfect alignment. Implications in materials synthesis, electronics, and biodiagnostics will be discussed.